Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

Adelmann, Christoph; Cuypers, Daniel; Tallarida, Massimo; Rodriguez, Leonard; De Clercq, Astrid; Friedrich, Daniel; Conard, Thierry; Delabie, Annelies; Seo, Jin Won; Locquet, Jean-Pierre; De Gendt, Stefan; Schmeisser, Dieter; Van Elshocht, Sven; Caymax, Matty

doi:10.1021/cm304070h

Publication:

Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

Date

2013

Journal article

https://doi.org/10.1021/cm304070h

Simple item page Full metadata Statistics

Author(s)

;

;

;

;

;

;

;

;

;

;

;

;

;

Journal

Chemistry of Materials

Statistics

1961 since deposited on 2021-10-21

5last month

3last week

Acq. date: 2026-08-06

Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

Date

Author(s)

Journal

Abstract

Description

Statistics

Views

Citations

Statistics

Views

Citations