Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

Adelmann, Christoph; Cuypers, Daniel; Tallarida, Massimo; Rodriguez, Leonard; De Clercq, Astrid; Friedrich, Daniel; Conard, Thierry; Delabie, Annelies; Seo, Jin Won; Locquet, Jean-Pierre; De Gendt, Stefan; Schmeisser, Dieter; Van Elshocht, Sven; Caymax, Matty

doi:10.1021/cm304070h

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Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

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2013

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https://doi.org/10.1021/cm304070h

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Chemistry of Materials

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1950 since deposited on 2021-10-21

Acq. date: 2025-12-11

Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

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