Publication:

Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETs

Date

2012
Proceedings Paper
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dc.contributor.authorSantos, S.D.
dc.contributor.authorNicoletti, T.
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorMartino, J.A.
dc.contributor.authorVeloso, Anabela
dc.contributor.authorJurczak, Gosia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-20T15:43:46Z
dc.date.available2021-10-20T15:43:46Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21457
dc.source.beginpage483
dc.source.conferenceProceedings of the 27th Symposium on Microelectronics Technology and Devices - SBMicro
dc.source.conferencedate30/08/2012
dc.source.conferencelocationBrasilia Brazil
dc.source.endpage489
dc.title

Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETs

dc.typeProceedings paper
dspace.entity.typePublication
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