Publication:

Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process

Date

2014
Proceedings Paper
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dc.contributor.authorFuchimoto, Daisuke
dc.contributor.authorIshimoto, Toru
dc.contributor.authorHiroyuki, Shindo
dc.contributor.authorSugahara, Hitoshi
dc.contributor.authorToyoda, Yasutaka
dc.contributor.authorMailfert, Julien
dc.contributor.authorDe Bisschop, Peter
dc.contributor.imecauthorMailfert, Julien
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.accessioned2021-10-22T01:33:04Z
dc.date.available2021-10-22T01:33:04Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23836
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1859765
dc.source.beginpage90500V
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVIII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.title

Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process

dc.typeProceedings paper
dspace.entity.typePublication
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