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In situ interface and surface characterization of Ge passivated III-V substrates for high-k oxide deposition

Date

2008
Proceedings Paper
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dc.contributor.authorMolle, Alessandro
dc.contributor.authorSpiga, Sabina
dc.contributor.authorFanciulli, Marco
dc.contributor.authorBrammertz, Guy
dc.contributor.authorMeuris, Marc
dc.contributor.imecauthorBrammertz, Guy
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecBrammertz, Guy::0000-0003-1404-7339
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-17T09:08:05Z
dc.date.available2021-10-17T09:08:05Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14184
dc.source.conferenceE-MRS Spring Meeting Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS
dc.source.conferencedate26/05/2008
dc.source.conferencelocationStrasbourg France
dc.title

In situ interface and surface characterization of Ge passivated III-V substrates for high-k oxide deposition

dc.typeProceedings paper
dspace.entity.typePublication
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