Publication:

Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists

Date

2009
Journal article
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dc.contributor.authorStrahan, Jeffrey R.
dc.contributor.authorAdams, Jacob R.
dc.contributor.authorJen, Wei-Lun
dc.contributor.authorVanleenhove, Anja
dc.contributor.authorNeikirk, Colin C.
dc.contributor.authorRochelle, Timothy
dc.contributor.authorGronheid, Roel
dc.contributor.authorWillson, C. Grant
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-18T03:25:23Z
dc.date.available2021-10-18T03:25:23Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16277
dc.source.beginpage43011
dc.source.issue4
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.volume8
dc.title

Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists

dc.typeJournal article
dspace.entity.typePublication
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