Publication:

Validation of immersion lithography OPC model accuracy

Date

2005
Proceedings Paper
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dc.contributor.authorEstroff, Andrew
dc.contributor.authorBailey, George
dc.contributor.authorKostas, Adam
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHendrickx, Eric
dc.date.accessioned2021-10-16T01:31:36Z
dc.date.available2021-10-16T01:31:36Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10437
dc.source.conference2nd International Symposium on Immersion Lithography
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
dc.title

Validation of immersion lithography OPC model accuracy

dc.typeProceedings paper
dspace.entity.typePublication
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