Publication:

Thin photoresist layers for microelectronic devices: a comparative study between ToF and Orbitrap™ mass analyzers.

Date

2019
Presentation
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dc.contributor.authorSpampinato, Valentina
dc.contributor.authorFranquet, Alexis
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorPollentier, Ivan
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorPirkl, Alexander
dc.contributor.authorKayser, Sven
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorvan der Heide, Paul
dc.contributor.imecauthorSpampinato, Valentina
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.orcidimecSpampinato, Valentina::0000-0003-3225-6740
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.date.accessioned2021-10-27T18:54:16Z
dc.date.available2021-10-27T18:54:16Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34056
dc.source.conferenceSIMS 22
dc.source.conferencedate20/10/2019
dc.source.conferencelocationKyoto Japan
dc.title

Thin photoresist layers for microelectronic devices: a comparative study between ToF and Orbitrap™ mass analyzers.

dc.typeOral presentation
dspace.entity.typePublication
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