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From ASML Alpha-demo tool to ASML NXE:3100 at imec - EUV lithography heading towards pre-production mode

Date

2011
Proceedings Paper
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dc.contributor.authorHendrickx, Eric
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorFoubert, Philippe
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-19T14:14:58Z
dc.date.available2021-10-19T14:14:58Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19061
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami, FL USA
dc.title

From ASML Alpha-demo tool to ASML NXE:3100 at imec - EUV lithography heading towards pre-production mode

dc.typeProceedings paper
dspace.entity.typePublication
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