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Resist process development for the EUV alpha demo tool at IMEC
Publication:
Resist process development for the EUV alpha demo tool at IMEC
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Date
2008
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17732.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Niroomand, Ardavan
;
Van Roey, Frieda
;
Hermans, Jan
;
Lorusso, Gian
;
Baudemprez, Bart
;
Pollentier, Ivan
;
de Marneffe, Jean-Francois
;
Demuynck, Steven
;
Jonckheere, Rik
;
Ronse, Kurt
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1911
since deposited on 2021-10-17
Acq. date: 2025-12-12
Citations
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1911
since deposited on 2021-10-17
Acq. date: 2025-12-12
Citations