Publication:

Resist process development for the EUV alpha demo tool at IMEC

Date

2008
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17732.pdf 410.27 KB

Author(s)

Goethals, Mieke
;
Niroomand, Ardavan
;
Van Roey, Frieda  
;
Hermans, Jan  
;
Lorusso, Gian  
;
Baudemprez, Bart  
;
Pollentier, Ivan  
;
de Marneffe, Jean-Francois  
;
Demuynck, Steven  
;
Jonckheere, Rik  
;
Ronse, Kurt  

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