Publication:

Diffraction based overlay metrology: accuracy and performance on front end stack

Date

2008
Proceedings Paper
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dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorKandel, Daniel
dc.contributor.authorAdel, Mike
dc.contributor.authorMarchelli, Anat
dc.contributor.authorVakshtein, Irina
dc.contributor.authorVasconi, Mauro
dc.contributor.authorSalski, Bartlomiej
dc.contributor.imecauthorLeray, Philippe
dc.date.accessioned2021-10-17T08:17:03Z
dc.date.available2021-10-17T08:17:03Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14014
dc.source.beginpage69220O
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXII
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Diffraction based overlay metrology: accuracy and performance on front end stack

dc.typeProceedings paper
dspace.entity.typePublication
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