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Development of an electroless copper deposition bath for via fill applications on TiN seed layers

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dc.contributor.authorPalmans, Roger
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-09-29T12:45:10Z
dc.date.available2021-09-29T12:45:10Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/290
dc.source.conferenceMRS Conference on Advanced Metallization for ULSI Applications; October 6-8, 1994; Austin, Texas, USA.
dc.source.conferencedate6/10/1994
dc.source.conferencelocationAustin, TX USA
dc.title

Development of an electroless copper deposition bath for via fill applications on TiN seed layers

dc.typeOral presentation
dspace.entity.typePublication
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