Wet-chemical etching of atom probe tips for artefact free analyses of nanoscaled semiconductor structures

dc.contributor.author	Melkonyan, Davit
dc.contributor.author	Fleischmann, Claudia
dc.contributor.author	Veloso, Anabela
dc.contributor.author	Franquet, Alexis
dc.contributor.author	Bogdanowicz, Janusz
dc.contributor.author	Morris, Richard
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.imecauthor	Fleischmann, Claudia
dc.contributor.imecauthor	Veloso, Anabela
dc.contributor.imecauthor	Franquet, Alexis
dc.contributor.imecauthor	Bogdanowicz, Janusz
dc.contributor.imecauthor	Morris, Richard
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.orcidimec	Fleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimec	Franquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimec	Bogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimec	Morris, Richard::0000-0002-0902-7088
dc.date.accessioned	2021-10-25T23:21:39Z
dc.date.available	2021-10-25T23:21:39Z
dc.date.issued	2018
dc.identifier.issn	0304-3991
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/31331
dc.identifier.url	https://www.sciencedirect.com/science/article/pii/S0304399117303728
dc.source.beginpage	1
dc.source.endpage	8
dc.source.journal	Ultramicroscopy
dc.source.volume	186
dc.title	Wet-chemical etching of atom probe tips for artefact free analyses of nanoscaled semiconductor structures
dc.type	Journal article
dspace.entity.type	Publication
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