Publication:
A single metrology tool solution for complete exposure tool setup
Date
| dc.contributor.author | Laidler, David | |
| dc.contributor.author | D'have, Koen | |
| dc.contributor.author | Charley, Anne-Laure | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Cheng, Shaunee | |
| dc.contributor.author | Dusa, Mircea | |
| dc.contributor.author | Vanoppen, Peter | |
| dc.contributor.author | Hinnen, Paul | |
| dc.contributor.imecauthor | Laidler, David | |
| dc.contributor.imecauthor | D'have, Koen | |
| dc.contributor.imecauthor | Charley, Anne-Laure | |
| dc.contributor.imecauthor | Leray, Philippe | |
| dc.contributor.imecauthor | Dusa, Mircea | |
| dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
| dc.contributor.orcidimec | D'have, Koen::0000-0002-5195-9241 | |
| dc.date.accessioned | 2021-10-18T17:55:37Z | |
| dc.date.available | 2021-10-18T17:55:37Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2010 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17423 | |
| dc.source.beginpage | 763809 | |
| dc.source.conference | Metrology, Inspection and Process Control for Microlithography XXIV | |
| dc.source.conferencedate | 21/02/2010 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | A single metrology tool solution for complete exposure tool setup | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |