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Conference contributions
Metrology accuracy and stability: the fundamental baseline for process monitoring and control
Publication:
Metrology accuracy and stability: the fundamental baseline for process monitoring and control
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Storms, Greet
;
Barry, Kelly
;
Cheng, Shaunee
Journal
Abstract
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1869
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Acq. date: 2025-12-11
Citations
Metrics
Views
1869
since deposited on 2021-10-16
2
last month
1
last week
Acq. date: 2025-12-11
Citations