Publication:

Heated implantation with amorphous carbon CMOS mask for scaled FinFETs

Date

2013
Proceedings Paper
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dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorSasaki, Yuichiro
dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorBoccardi, Guillaume
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorLee, Jae Woo
dc.contributor.authorKhaja, Fareen
dc.contributor.authorColombeau, Benjamin
dc.contributor.authorGodet, Ludovic
dc.contributor.authorMartin, Patrick
dc.contributor.authorBrus, Stephan
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorMannaert, Geert
dc.contributor.authorDekkers, Harold
dc.contributor.authorHellings, Geert
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorThean, Aaron
dc.contributor.imecauthorBoccardi, Guillaume
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecBoccardi, Guillaume::0000-0003-3226-4572
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-21T12:45:58Z
dc.date.available2021-10-21T12:45:58Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23172
dc.identifier.urlhttp://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6576650&tag=1
dc.source.beginpage196
dc.source.conferenceSymposium on VLSI Technology - VLSIT
dc.source.conferencedate10/06/2013
dc.source.conferencelocationKyoto Japan
dc.source.endpage197
dc.title

Heated implantation with amorphous carbon CMOS mask for scaled FinFETs

dc.typeProceedings paper
dspace.entity.typePublication
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