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Study reactive ion etching- transformer coupled plasma (RIE-TCP) mode for patterning of MgZnO alloys, used for computing and memory applications
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Study reactive ion etching- transformer coupled plasma (RIE-TCP) mode for patterning of MgZnO alloys, used for computing and memory applications
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Date
2023-09-25
Meeting abstract
https://doi.org/10.1145/3568162.3578633
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ghorbani, Leila
;
Kundu, Shreya
;
Lazzarino, Frederic
;
De Gendt, Stefan
Journal
N/A
Abstract
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Downloads
107
since deposited on 2023-09-15
23
last month
1
last week
Acq. date: 2026-02-24
Views
134
since deposited on 2023-09-15
Acq. date: 2026-02-24
Citations