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Glyoxylic acid as reducing agent for electroless copper deposition on cobalt liner

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dc.contributor.authorInoue, Fumihiro
dc.contributor.authorPhilipsen, Harold
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorVan Huylenbroeck, Stefaan
dc.contributor.authorArmini, Silvia
dc.contributor.authorStruyf, Herbert
dc.contributor.authorShingubara, Shoso
dc.contributor.authorTanaka, Tetsu
dc.contributor.imecauthorInoue, Fumihiro
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorVan Huylenbroeck, Stefaan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecVan Huylenbroeck, Stefaan::0000-0001-9978-3575
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2021-10-22T19:50:50Z
dc.date.available2021-10-22T19:50:50Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25415
dc.identifier.urlhttp://ecst.ecsdl.org/content/64/40/63.full.pdf
dc.source.beginpage63
dc.source.conferenceProcessing Materials of 3D Interconnects, Damascene, and Electronics Packaging 6
dc.source.conferencedate5/10/2014
dc.source.conferencelocationCancun Mexico
dc.source.endpage75
dc.title

Glyoxylic acid as reducing agent for electroless copper deposition on cobalt liner

dc.typeProceedings paper
dspace.entity.typePublication
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