Publication:

Advanced cleaning for the growth of ultrathin gate oxide

Date

1999
Journal article
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dc.contributor.authorMertens, Paul
dc.contributor.authorBearda, Twan
dc.contributor.authorHoussa, Michel
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKenis, Karine
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVos, Rita
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-14T11:30:38Z
dc.date.available2021-10-14T11:30:38Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3672
dc.source.beginpage199
dc.source.endpage206
dc.source.issue1_4
dc.source.journalMicroelectronic Engineering
dc.source.volume48
dc.title

Advanced cleaning for the growth of ultrathin gate oxide

dc.typeJournal article
dspace.entity.typePublication
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