Publication:

Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2641768
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Author(s)

Hasan, Mahmudul  
;
Beral, Christophe  
;
Lorusso, Gian  
;
De Simone, Danilo  
;
Moussa, Alain  
;
Van den Heuvel, Dieter
;
Charley, Anne-Laure  
;
Leray, Philippe  

Journal

Proceedings of SPIE

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1196 since deposited on 2023-03-22
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1196 since deposited on 2023-03-22
1last month
Acq. date: 2026-01-26

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