Publication:

Plasma enhanced atomic layer deposited Ru for MIMCAP applications

Date

2011
Proceedings Paper
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dc.contributor.authorSwerts, Johan
dc.contributor.authorSalimullah, M.M.
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorKim, Min-Soo
dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSchaekers, Marc
dc.contributor.authorTomida, Kazuyuki
dc.contributor.authorKaczer, Ben
dc.contributor.authorOpsomer, Karl
dc.contributor.authorVrancken, Christa
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorAltimime, Laith
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorTomida, Kazuyuki
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-19T19:25:28Z
dc.date.available2021-10-19T19:25:28Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19856
dc.source.beginpage41
dc.source.conferenceAtomic Layer Deposition Applications 7
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
dc.source.endpage51
dc.title

Plasma enhanced atomic layer deposited Ru for MIMCAP applications

dc.typeProceedings paper
dspace.entity.typePublication
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