Publication:

Insertion loss and polarization-dependent loss measurement improvement to enable parallel silicon photonics wafer-level testing

Date

2025-MAR
Journal article
https://doi.org/10.1016/j.optlaseng.2024.108742
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dc.contributor.authorKim, Daehong
dc.contributor.authorDe Coster, Jeroen
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorBan, Yoojin
dc.contributor.authorVelenis, Dimitrios
dc.contributor.authorSar, Huseyin
dc.contributor.authorKobbi, Hakim
dc.contributor.authorMagdziak, Rafal
dc.contributor.authorKim, Younghyun
dc.contributor.imecauthorDe Coster, Jeroen
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorBan, Yoojin
dc.contributor.imecauthorVelenis, Dimitrios
dc.contributor.imecauthorSar, Huseyin
dc.contributor.imecauthorKobbi, Hakim
dc.contributor.imecauthorMagdziak, Rafal
dc.contributor.orcidimecDe Coster, Jeroen::0000-0002-4893-0691
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecBan, Yoojin::0000-0001-7319-8132
dc.contributor.orcidimecVelenis, Dimitrios::0000-0001-7947-8098
dc.contributor.orcidimecSar, Huseyin::0000-0002-4993-1258
dc.contributor.orcidimecMagdziak, Rafal::0009-0007-0378-302X
dc.date.accessioned2024-12-18T17:14:31Z
dc.date.available2024-12-18T17:14:31Z
dc.date.issued2025-MAR
dc.description.wosFundingTextThis research was supported by the MOTIE (Ministry of Trade, Industry, and Energy) in Korea under the Fostering Global Talents for Innovative Growth Program (P0017312) supervised by the Korea Institute for Advancement of Technology (KIAT) , by the Korea Basic Science Institute (National Research Facilities and Equipment Center) grantfunded by the Ministry of Education (grant No. 2023R1A6C103A035, No. 2021R1A6C101A405) , by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (RS-2024-00342979) , and by the Technology Innovation Program (20015909) through the Korea Evaluation Institute of Industrial Technology (KEIT) , funded by the Ministry of Trade, Industry & Energy (MOTIE, Korea) .
dc.identifier.doi10.1016/j.optlaseng.2024.108742
dc.identifier.issn0143-8166
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44991
dc.publisherELSEVIER SCI LTD
dc.source.beginpage108742
dc.source.issueMarch
dc.source.journalOPTICS AND LASERS IN ENGINEERING
dc.source.numberofpages7
dc.source.volume186
dc.subject.keywordsBIREFRINGENCE
dc.title

Insertion loss and polarization-dependent loss measurement improvement to enable parallel silicon photonics wafer-level testing

dc.typeJournal article
dspace.entity.typePublication
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