Publication:

Deposition processes for the fabrication of epitaxial Si-O superlattices

Date

2013
Proceedings Paper
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dc.contributor.authorDelabie, Annelies
dc.contributor.authorJayachandran, Suseendran
dc.contributor.authorMaggen, Jens
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorJayachandran, Suseendran
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-21T07:16:25Z
dc.date.available2021-10-21T07:16:25Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22249
dc.source.beginpage33
dc.source.conference8th International Conference on Silicon Epitaxy and Heterostructures - ICSI-8
dc.source.conferencedate2/06/2013
dc.source.conferencelocationFukuoka Japan
dc.source.endpage34
dc.title

Deposition processes for the fabrication of epitaxial Si-O superlattices

dc.typeProceedings paper
dspace.entity.typePublication
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