Publication:

Track height reduction for standard-cell in below 5nm node: How low can you go?

Date

2018
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorSherazi, Yasser
dc.contributor.authorChae, Jung Kyu
dc.contributor.authorDebacker, Peter
dc.contributor.authorMattii, Luca
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorGerousis, V.
dc.contributor.authorVerkest, Diederik
dc.contributor.authorMocuta, Anda
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorSpessot, Alessio
dc.contributor.authorRyckaert, Julien
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.imecauthorDebacker, Peter
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.orcidimecDebacker, Peter::0000-0003-3825-5554
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.date.accessioned2021-10-26T03:42:48Z
dc.date.available2021-10-26T03:42:48Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31765
dc.identifier.urlhttps://doi.org/10.1117/12.2297191
dc.source.beginpage1058809
dc.source.conferenceDesign-Process-Technology Co-optimization for Manufacturability XII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

Track height reduction for standard-cell in below 5nm node: How low can you go?

dc.typeMeeting abstract
dspace.entity.typePublication
Files

Original bundle

Name:
36917.pdf
Size:
1.47 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions