Publication:

In situ X-ray diffraction study of self-forming barriers from a Cu-Mn alloy in 100 nm Cu/low-k damascene interconnects using synchrotron radiation

Date

2010
Journal article
https://doi.org/10.1016/j.mee.2009.06.023
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dc.contributor.authorWilson, Chris
dc.contributor.authorVolders, Henny
dc.contributor.authorCroes, Kristof
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorBeyer, Gerald
dc.contributor.authorHorsfall, Alton B.
dc.contributor.authorO'Neill, Anthony G.
dc.contributor.authorTokei, Zsolt
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorVolders, Henny
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.accessioned2021-10-19T00:30:32Z
dc.date.available2021-10-19T00:30:32Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.doi10.1016/j.mee.2009.06.023
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18359
dc.source.beginpage398
dc.source.endpage401
dc.source.issue3
dc.source.journalMicroelectronic Engineering
dc.source.volume87
dc.title

In situ X-ray diffraction study of self-forming barriers from a Cu-Mn alloy in 100 nm Cu/low-k damascene interconnects using synchrotron radiation

dc.typeJournal article
dspace.entity.typePublication
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