Publication:
Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV
| dc.contributor.author | Hermans, Yannick | |
| dc.contributor.author | Decoster, Stefan | |
| dc.contributor.author | Wu, Chen | |
| dc.contributor.author | Doise, Jan | |
| dc.contributor.author | Renaud, Vincent | |
| dc.contributor.author | Van den Heuvel, Dieter | |
| dc.contributor.author | Park, Seongho | |
| dc.contributor.author | Rincon Delgadillo, Paulina | |
| dc.contributor.author | Tokei, Zsolt | |
| dc.contributor.imecauthor | Hermans, Yannick | |
| dc.contributor.imecauthor | Decoster, Stefan | |
| dc.contributor.imecauthor | Wu, Chen | |
| dc.contributor.imecauthor | Renaud, Vincent | |
| dc.contributor.imecauthor | Van den Heuvel, Dieter | |
| dc.contributor.imecauthor | Park, Seongho | |
| dc.contributor.imecauthor | Tokei, Zsolt | |
| dc.contributor.imecauthor | Rincon Delgadillo, Paulina | |
| dc.contributor.orcidimec | Hermans, Yannick::0000-0002-6973-0795 | |
| dc.contributor.orcidimec | Decoster, Stefan::0000-0003-1162-9288 | |
| dc.contributor.orcidimec | Wu, Chen::0000-0002-4636-8842 | |
| dc.contributor.orcidimec | Renaud, Vincent::0009-0009-7686-4474 | |
| dc.contributor.orcidimec | Van Den Heuvel, Dieter::0009-0008-6879-2178 | |
| dc.contributor.orcidimec | Park, Seongho::0000-0002-1058-9424 | |
| dc.contributor.orcidimec | Tokei, Zsolt::0000-0003-3545-3424 | |
| dc.date.accessioned | 2025-06-17T12:28:54Z | |
| dc.date.available | 2025-05-11T05:43:42Z | |
| dc.date.available | 2025-06-17T12:28:54Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1117/12.3034200 | |
| dc.identifier.eisbn | 978-1-5106-8156-9 | |
| dc.identifier.isbn | 978-1-5106-8155-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45650 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.conference | 2024 International Conference on Extreme Ultraviolet Lithography | |
| dc.source.conferencedate | SEP 30-OCT 03, 2024 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | N/A | |
| dc.source.numberofpages | 11 | |
| dc.source.volume | 13215 | |
| dc.title | Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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