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EUV single patterning for logic metal layers: achievement and challenge

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dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorGillijns, Werner
dc.contributor.authorDrissi, Youssef
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorBlanco, Victor
dc.contributor.authorLariviere, Stephane
dc.contributor.authorDe Ruyter, Rudi
dc.contributor.authorDehan, Morin
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorTan, Ling Ee
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorDrissi, Youssef
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorDe Ruyter, Rudi
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.contributor.orcidimecDe Ruyter, Rudi::0000-0002-8145-288X
dc.date.accessioned2021-10-24T06:56:23Z
dc.date.available2021-10-24T06:56:23Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28683
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/10450/1045004/EUV-single-patterning-for-logic-metal-layers--ac
dc.source.beginpage1045004
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate17/09/2017
dc.source.conferencelocationMonterey, CA USA
dc.title

EUV single patterning for logic metal layers: achievement and challenge

dc.typeProceedings paper
dspace.entity.typePublication
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