Publication:

Recent advancements in EUV resist materials and process performance

Date

2011
Journal article
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dc.contributor.authorGoethals, Mieke
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorHosokawa, Kohei
dc.contributor.authorPollentier, Ivan
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-19T13:47:47Z
dc.date.available2021-10-19T13:47:47Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18969
dc.source.beginpage25
dc.source.endpage31
dc.source.issue1
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume24
dc.title

Recent advancements in EUV resist materials and process performance

dc.typeJournal article
dspace.entity.typePublication
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