Publication:
CoSi2 formation using a Ti capping layer - influence of processing conditions on CoSi2 nucleation
Date
| dc.contributor.author | Detavernier, C. | |
| dc.contributor.author | Van Meirhaeghe, R. | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-10-14T16:50:53Z | |
| dc.date.available | 2021-10-14T16:50:53Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5247 | |
| dc.source.conference | Symposium K of the MRS Spring Meeting: Gate Stack and Silicide Issues in Si Processing II; 16-20 April 2001; San Francisco, CA, | |
| dc.source.conferencelocation | ||
| dc.title | CoSi2 formation using a Ti capping layer - influence of processing conditions on CoSi2 nucleation | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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