Publication:

Advances in strained layers and strained-layer devices

Date

1998
Proceedings Paper
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dc.contributor.authorVan Hoof, Chris
dc.contributor.authorGenoe, Jan
dc.contributor.authorNemeth, Stefan
dc.contributor.authorJain, Suresh
dc.contributor.authorBorghs, Gustaaf
dc.contributor.authorMertens, Robert
dc.contributor.authorVan Overstraeten, Roger
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.imecauthorGenoe, Jan
dc.contributor.imecauthorNemeth, Stefan
dc.contributor.imecauthorBorghs, Gustaaf
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecGenoe, Jan::0000-0002-4019-5979
dc.date.accessioned2021-10-01T09:17:52Z
dc.date.available2021-10-01T09:17:52Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3046
dc.source.beginpage554
dc.source.conferencePhysics of Semiconductor Devices
dc.source.conferencedate16/12/1997
dc.source.conferencelocationNew Delhi India
dc.source.endpage562
dc.title

Advances in strained layers and strained-layer devices

dc.typeProceedings paper
dspace.entity.typePublication
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