Publication:
Optically induced mask criical dimension error magnification in 248 nm lithography
Date
| dc.contributor.author | Randall, John | |
| dc.contributor.author | Tritchkov, Alexander | |
| dc.date.accessioned | 2021-10-01T08:45:50Z | |
| dc.date.available | 2021-10-01T08:45:50Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2894 | |
| dc.source.beginpage | 3606 | |
| dc.source.endpage | 3611 | |
| dc.source.issue | 6 | |
| dc.source.journal | Journal of Vacuum Science and Technology B | |
| dc.source.volume | 12 | |
| dc.title | Optically induced mask criical dimension error magnification in 248 nm lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |