Publication:

Material and process optimization for EUV pattern rectification by DSA

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3010817
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Published version 1.25 MB

Author(s)

Verstraete, Lander  
;
Suh, Hyo Seon  
;
Van Bel, Julie  
;
Bak, Byeong-U  
;
Kim, Seong Eun  
;
Vallat, Remi  
;
Bezard, Philippe  
;
Beggiato, Matteo  
;
Beral, Christophe  

Journal

Proceedings of SPIE

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2039 since deposited on 2024-06-06
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780 since deposited on 2024-06-06
17last month
6last week
Acq. date: 2026-09-16

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