Material and process optimization for EUV pattern rectification by DSA

Verstraete, Lander; Suh, Hyo Seon; Van Bel, Julie; Bak, Byeong-U; Kim, Seong Eun; Vallat, Remi; Bezard, Philippe; Beggiato, Matteo; Beral, Christophe

doi:10.1117/12.3010817

Publication:

Material and process optimization for EUV pattern rectification by DSA

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3010817

Simple item page Full metadata Statistics

Files

Published version 1.25 MB

Author(s)

;

;

;

;

;

;

;

;

Journal

Proceedings of SPIE

Statistics

1620 since deposited on 2024-06-06

55last month

7last week

Acq. date: 2026-04-06

756 since deposited on 2024-06-06

10last month

1last week

Acq. date: 2026-04-06

Material and process optimization for EUV pattern rectification by DSA

Date

Files

Author(s)

Journal

Abstract

Description

Statistics

Downloads

Views

Citations

Statistics

Downloads

Views

Citations