Material and process optimization for EUV pattern rectification by DSA

Verstraete, Lander; Suh, Hyo Seon; Van Bel, Julie; Bak, Byeong-U; Kim, Seong Eun; Vallat, Remi; Bezard, Philippe; Beggiato, Matteo; Beral, Christophe

doi:10.1117/12.3010817

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Material and process optimization for EUV pattern rectification by DSA

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3010817

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Proceedings of SPIE

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Material and process optimization for EUV pattern rectification by DSA

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