Publication:

Technology and reliability of sub-3nm oxides

Date

1999
Proceedings Paper
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dc.contributor.authorHeyns, Marc
dc.contributor.authorNigam, Tanya
dc.contributor.authorDegraeve, Robin
dc.contributor.authorMertens, Paul
dc.contributor.authorSchaekers, Marc
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorMaes, Herman
dc.contributor.authorHoussa, Michel
dc.contributor.authorVandewalle, N.
dc.contributor.authorAusloos, M.
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHoussa, Michel
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.date.accessioned2021-10-06T11:21:23Z
dc.date.available2021-10-06T11:21:23Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3512
dc.source.beginpage1
dc.source.conference4th Symposium on Thin Gate Oxides
dc.source.conferencedate22/01/1999
dc.source.conferencelocationGotemba Japan
dc.source.endpage7
dc.title

Technology and reliability of sub-3nm oxides

dc.typeProceedings paper
dspace.entity.typePublication
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