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Nitrided hafnium silicates for gate dielectrics

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dc.contributor.authorWang, C.G.
dc.contributor.authorVelasco, H.
dc.contributor.authorVerghese, M.
dc.contributor.authorShero, E.
dc.contributor.authorWilk, G.
dc.contributor.authorMaes, Jan
dc.contributor.authorLaitinen, O.
dc.contributor.authorDeweerd, Wim
dc.contributor.authorDelabie, Annelies
dc.contributor.authorOpila, R.L.
dc.contributor.authorMathew, A.
dc.contributor.authorDemirkan, K.
dc.contributor.authorMorais, J.
dc.contributor.authorBaumvol, I.J.R.
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDelabie, Annelies
dc.date.accessioned2021-10-15T17:48:35Z
dc.date.available2021-10-15T17:48:35Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9898
dc.source.beginpageDI-MoA5
dc.source.conferenceAVS 51st International Symposium
dc.source.conferencedate14/11/2004
dc.source.conferencelocationAnaheim, CA USA
dc.title

Nitrided hafnium silicates for gate dielectrics

dc.typeMeeting abstract
dspace.entity.typePublication
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