Publication:
The control and impact of processing ambient during RTP
Date
| dc.contributor.author | Maex, Karen | |
| dc.contributor.author | Kondoh, Eiichi | |
| dc.contributor.author | Lauwers, Anne | |
| dc.contributor.author | de Potter de ten Broeck, Muriel | |
| dc.contributor.author | Proost, Joris | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.contributor.imecauthor | Lauwers, Anne | |
| dc.contributor.imecauthor | de Potter de ten Broeck, Muriel | |
| dc.date.accessioned | 2021-10-01T08:29:32Z | |
| dc.date.available | 2021-10-01T08:29:32Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2749 | |
| dc.source.beginpage | 239 | |
| dc.source.conference | Advanced Interconnects and Contact Materials and Processes for Future Integrated Circuits | |
| dc.source.conferencedate | 13/04/1998 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.title | The control and impact of processing ambient during RTP | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |