Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Characterization of post-etched photoresist and residues by various analytical techniques
Publication:
Characterization of post-etched photoresist and residues by various analytical techniques
Copy permalink
Date
2007-11
Meeting abstract
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Franquet, Alexis
;
Claes, Martine
;
Conard, Thierry
;
Kesters, Els
;
Vereecke, Guy
;
Vandervorst, Wilfried
Journal
Abstract
Description
Metrics
Views
1865
since deposited on 2021-10-16
3
last month
3
last week
Acq. date: 2025-12-15
Citations
Metrics
Views
1865
since deposited on 2021-10-16
3
last month
3
last week
Acq. date: 2025-12-15
Citations