Publication:

Correction to: Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching (vol 43, 023007, 2025)

Date

2025
Journal Article Correction
https://doi.org/10.1116/6.0004555
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dc.contributor.authorArvind, Shikhar
dc.contributor.authorFallica, Roberto
dc.contributor.authorBezard, Philippe
dc.contributor.authorPetersen, John
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLarsen, Esben W.
dc.contributor.imecauthorArvind, Shikhar
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLarsen, Esben W.
dc.contributor.orcidimecArvind, Shikhar::0000-0002-4748-7763
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.contributor.orcidimecPetersen, John::0000-0003-4815-3770
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2025-04-01T06:43:19Z
dc.date.available2025-04-01T06:43:19Z
dc.date.issued2025
dc.identifier.doi10.1116/6.0004555
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45475
dc.original.retractedhttps://imec-publications.be/handle/20.500.12860/45362
dc.publisherA V S AMER INST PHYSICS
dc.source.beginpage037001
dc.source.issue3
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
dc.source.numberofpages1
dc.source.volume43
dc.title

Correction to: Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching (vol 43, 023007, 2025)

dc.typeJournal article correction
dspace.entity.typePublication
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