Publication:

Wet clean applications in porous low-k patterning processes

Date

2012
Book Chapter
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dc.contributor.authorLe, Quoc Toan
dc.contributor.authorVereecke, Guy
dc.contributor.authorStruyf, Herbert
dc.contributor.authorKesters, Els
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorKesters, Els
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-20T12:35:27Z
dc.date.available2021-10-20T12:35:27Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20994
dc.source.beginpage129
dc.source.bookAdvanced Interconnects for ULSI Technology
dc.source.endpage172
dc.title

Wet clean applications in porous low-k patterning processes

dc.typeBook chapter
dspace.entity.typePublication
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