Publication:

Introducing 193 nm lithography

Date

1998
Proceedings Paper
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dc.contributor.authorPollers, Ingrid
dc.contributor.authorJaenen, Patrick
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorDavies, G.
dc.contributor.authorHeskamp, B.
dc.contributor.authorBakker, H.
dc.contributor.authorMcCoo, E.
dc.contributor.authorMulkens, J.
dc.contributor.authorStoeldraijer, J.
dc.contributor.authorSytsma, J.
dc.contributor.authorVan der Vleuten, B.
dc.contributor.authorVleeming, Bert
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorSlater, S.
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan Driessche, Veerle
dc.date.accessioned2021-10-01T08:42:02Z
dc.date.available2021-10-01T08:42:02Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2870
dc.source.beginpage179
dc.source.conferenceProceedings of the Microlithography Symposium. Interface '98
dc.source.conferencedate15/11/1998
dc.source.conferencelocationSan Diego, CA USA
dc.source.endpage198
dc.title

Introducing 193 nm lithography

dc.typeProceedings paper
dspace.entity.typePublication
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