Publication:
Advanced front-end processes for the 45nm CMOS technology node
Date
dc.contributor.author | Collart, E.J.H. | |
dc.contributor.author | Felch, S.B. | |
dc.contributor.author | Graoui, H. | |
dc.contributor.author | Tallavarjula, S. | |
dc.contributor.author | Lindsay, Richard | |
dc.contributor.author | Pawlak, Bartek | |
dc.contributor.author | van den Berg, J.A. | |
dc.contributor.author | Cowern, N.E.B. | |
dc.contributor.author | Kirby, K.J. | |
dc.contributor.imecauthor | Pawlak, Bartek | |
dc.date.accessioned | 2021-10-15T12:55:10Z | |
dc.date.available | 2021-10-15T12:55:10Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8708 | |
dc.source.conference | E-MRS Spring Meeting Symposium B: Materials Science Issues in Advanced CMOS Source-Drain Engineering | |
dc.source.conferencedate | 24/05/2004 | |
dc.source.conferencelocation | Strasbourg France | |
dc.title | Advanced front-end processes for the 45nm CMOS technology node | |
dc.type | Oral presentation | |
dspace.entity.type | Publication | |
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