Publication:

Elimination of HF-last cleaning related CoSi2 defects formation

Date

1994
Proceedings Paper
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dc.contributor.authorZou, Gang
dc.contributor.authorJonckx, Franky
dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorKuper, Werner
dc.contributor.authorMaex, Karen
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.authorLocke, Klaus
dc.contributor.authorKorac, M.
dc.contributor.authorSchild, R.
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-29T12:54:27Z
dc.date.available2021-09-29T12:54:27Z
dc.date.embargo9999-12-31
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/478
dc.source.beginpage177
dc.source.conferenceProceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/1994
dc.source.conferencelocationBrugge Belgium
dc.source.endpage180
dc.title

Elimination of HF-last cleaning related CoSi2 defects formation

dc.typeProceedings paper
dspace.entity.typePublication
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