Publication:

Stress relaxation in Al(Cu) thin films

Date

1997
Journal article
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dc.contributor.authorProost, Joris
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorCosemans, P.
dc.contributor.authorRoussel, Philippe
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-09-30T09:25:50Z
dc.date.available2021-09-30T09:25:50Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2097
dc.source.beginpage137
dc.source.endpage147
dc.source.journalMicroelectronic Engineering
dc.source.volume33
dc.title

Stress relaxation in Al(Cu) thin films

dc.typeJournal article
dspace.entity.typePublication
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