Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies

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Author(s)

Davydova, Natalia

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Kottumakulal, Ram

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Hoefnagels, Rik

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Vaenkatesan, V.

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van Dijk, Andre

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De Kruif, Robert

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Jonckheere, Rik

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Schiffelers, Guido

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van Setten, Eelco

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Metrics

2006 since deposited on 2021-10-22

Acq. date: 2025-10-23