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Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
Publication:
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
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Date
2015
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Davydova, Natalia
;
Kottumakulal, Ram
;
Hageman, J.
;
McNamara, J.
;
Hoefnagels, Rik
;
Vaenkatesan, V.
;
van Dijk, Andre
;
Ricken, K.
;
de Winter, L.
;
De Kruif, Robert
;
Jonckheere, Rik
;
Hollink, T.
;
Schiffelers, Guido
;
van Setten, Eelco
;
Colsters, P.
;
Liebregts, W.
;
Pellens1, Rudy
;
van Dijk, Joep
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2009
since deposited on 2021-10-22
1
last month
Acq. date: 2025-12-09
Citations
Metrics
Views
2009
since deposited on 2021-10-22
1
last month
Acq. date: 2025-12-09
Citations