Publication:
CD control using SiON BARL processing for sub 0.25µm lithography
Date
| dc.contributor.author | Zhang, Fenghong | |
| dc.contributor.author | Op de Beeck, Maaike | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Gangala, Hareen K | |
| dc.contributor.author | Gopalan, P. | |
| dc.contributor.author | Conley, P. | |
| dc.contributor.author | Dusa, M. | |
| dc.contributor.author | Bendik, Joe | |
| dc.contributor.imecauthor | Op de Beeck, Maaike | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Op de Beeck, Maaike::0000-0002-2700-6432 | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-01T09:52:04Z | |
| dc.date.available | 2021-10-01T09:52:04Z | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3168 | |
| dc.source.conference | MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium. | |
| dc.source.conferencelocation | ||
| dc.title | CD control using SiON BARL processing for sub 0.25µm lithography | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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