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Kinetic modeling of Ru area-selective atomic layer deposition in nanopatterns

Date

2020
Meeting abstract
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dc.contributor.authorClerix, Jan-Willem
dc.contributor.authorMarques, Esteban
dc.contributor.authorSoethoudt, Job
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorClerix, Jan-Willem
dc.contributor.imecauthorMarques, Esteban
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecClerix, Jan-Willem::0000-0002-2681-4569
dc.date.accessioned2021-10-28T20:47:01Z
dc.date.available2021-10-28T20:47:01Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34917
dc.source.conferenceAVS Atomic Layer Deposition Conference
dc.source.conferencedate28/06/2020
dc.source.conferencelocationGent Belgium
dc.title

Kinetic modeling of Ru area-selective atomic layer deposition in nanopatterns

dc.typeMeeting abstract
dspace.entity.typePublication
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