Publication:

Fundamental study of atomic layer deposition in and on porous low-k films

Date

2011
Proceedings Paper
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dc.contributor.authorVerdonck, Patrick
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSwerts, Johan
dc.contributor.authorFarrell, L
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorTielens, Hilde
dc.contributor.authorVan Besien, Els
dc.contributor.authorWitters, J.
dc.contributor.authorNyns, Laura
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-19T20:58:02Z
dc.date.available2021-10-19T20:58:02Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20051
dc.source.beginpageP1.10
dc.source.conferenceIEEE International Interconnect Technology Conference and Materials for Advanced Metallization - IITC/MAM
dc.source.conferencedate8/05/2011
dc.source.conferencelocationDresden Germany
dc.title

Fundamental study of atomic layer deposition in and on porous low-k films

dc.typeProceedings paper
dspace.entity.typePublication
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