Publication:
TiSi(Ge) contacts formed at low temperature achieving around 2x10-9 $Xcm2 contact resistivities to p-SiGe
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2033 since deposited on 2021-10-24
Acq. date: 2025-10-23
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Views
2033 since deposited on 2021-10-24
Acq. date: 2025-10-23
Citations