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Constant voltage stress induced degradation in HfO2/SiO2 gate dielectric stacks
Publication:
Constant voltage stress induced degradation in HfO2/SiO2 gate dielectric stacks
Date
2002
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Zhen
;
Houssa, Michel
;
Carter, Richard
;
Naili, Mohamed
;
De Gendt, Stefan
;
Heyns, Marc
Journal
Journal of Applied Physics
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1954
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1954
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations