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Characterizing the two-dimensional doping concentration inside silicon-nanowires using scanning spreading resistance microscopy
Publication:
Characterizing the two-dimensional doping concentration inside silicon-nanowires using scanning spreading resistance microscopy
Date
2009
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hantschel, Thomas
;
Schulz, Volker
;
Schulze, Andreas
;
Angeletti, Esteban
;
Guder, Firat
;
Schmidt, Volker
;
Senz, Stephan
;
Eyben, Pierre
;
Vandervorst, Wilfried
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1928
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Views
1928
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2025-12-08
Citations