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Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas
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1974 since deposited on 2021-09-30
1last month
Acq. date: 2025-12-09
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Metrics
Views
1974 since deposited on 2021-09-30
1last month
Acq. date: 2025-12-09
Citations