Selection of ESH solvents for the wet removal of post-etch photoresists in low-k dielectrics integration

dc.contributor.author	Kesters, Els
dc.contributor.author	Claes, Martine
dc.contributor.author	Le, Quoc Toan
dc.contributor.author	Barthomeuf, Kevin
dc.contributor.author	Lux, Marcel
dc.contributor.author	Vereecke, Guy
dc.contributor.author	Durkee, John
dc.contributor.imecauthor	Kesters, Els
dc.contributor.imecauthor	Claes, Martine
dc.contributor.imecauthor	Le, Quoc Toan
dc.contributor.imecauthor	Lux, Marcel
dc.contributor.imecauthor	Vereecke, Guy
dc.contributor.orcidimec	Le, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimec	Vereecke, Guy::0000-0001-9058-9338
dc.date.accessioned	2021-10-17T23:24:24Z
dc.date.available	2021-10-17T23:24:24Z
dc.date.issued	2009
dc.identifier.issn	0167-9317
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/15587
dc.source.beginpage	160
dc.source.endpage	164
dc.source.issue	2
dc.source.journal	Microelectronic Engineering
dc.source.volume	86
dc.title	Selection of ESH solvents for the wet removal of post-etch photoresists in low-k dielectrics integration
dc.type	Journal article
dspace.entity.type	Publication
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